광소결, 광어닐링, PHOTONIC SINTERING EQUIPMENTS, 솔더링, LIGHT ANNEALING, SOLDERING, 광열처리

UV경화 / 세정 시스템	적외선 건조시스템	펄스UV경화 시스템	제논 조사장치	내후성 시험장비	광계측 분석기기	솔라셀 제조장비


UV 경화 시스템, 모듈형 UV 경화시스템 UV 세정 시스템 UV 노광 시스템 SPOT UV, UV LED FLOOD UV 외	MIR / NIR 건조시스템 적외선 건조시스템 IR / 열풍 건조시스템 소성로 (FIRING FURNACE)	펄스UV 경화 시스템 펄스UV 세정 시스템 외	제논 조사장치 75W, 100W, 150W 200W, 300W, 1 kW 3 kW ~ Max. 15 kW	내후성 시험장비 WEATHER TESTER 기타 주문형 시험장비	광량계, 광계측기 광분석시스템 광모니터링 시스템 외	솔라셀 제조장비 SOLAR FIRING SOLAR SIMULATOR (CELL, MODULE) SOLAR CELL PRINTING


X-UV 시스템	램프 및 기타제품	광신터링 시스템	스크린 인쇄 시스템	수처리 살균 시스템	LED / BLU 검사장비	엔지니어링


X-UV 경화 시스템 PHOTONIC ACTIVATION X-UV 살균, 세정 외	MIR / NIR 램프, 제논램프 펄스UV램프 솔라시뮬레이션 램프 외	X-LIGHT 신터링 시스템 X-LIGHT 어닐링 시스템 PHOTONIC CURING SYS	평면 스크린인쇄 시스템 (자동, 반자동, 인라인)	펄스UV 수처리 시스템 펄스UV 살균 시스템	LED BLU 휘도 검사시스템 LED 조도 검사시스템 SWIR검사, X-RAY검사 NEUTRON 검사시스템	솔라셀 제조 라인 인쇄 코팅, 전처리, 건조, 경화 생산 라인 롤 코터 / DIP 코터 라인



X-LIGHT ANNEALING (광어닐링)										Home > Surface Treatment > Photonic Curing

	X-LIGHT SINTERING

	X-LIGHT ANNEALING

X-LIGHT 광소결 / 광어닐링 시스템 (X-LIGHT ANNEALING SYSTEM)

PHOTONIC SINTERING / ANNEALING / SOLDERING / CURING TECHNOLOGY

관련기술이 필요하신분은 당사로 문의주시기 바랍니다 !!

TEL : 031-497-1134

LTPS BASIC

폴리실리콘

Polysilicon is a Silicon-based material, which contains numerous Si grains with sizes ranging from 0.1 to several um. In semiconductor manufacturing, polysilicon is usually prepared by LPCVD (Low Pressure Chemical Vapor Deposition) and then annealed above 900°C, i.e. so called SPC (Solid Phase Crystallization) method. Obviously, the same way could not be applied to FPD industry since the strain temperature of glass is only about 650°C. Therefore, Low Temperature Polysilicon (LTPS) technology is the novel technology specific for FPD application.

LTPS (Low Temperature Poly Silicon)

Currently there are several approaches in the preparation of LTPS film on glass or plastic substrate:

Metal Induced Crystallization (MIC): It is a kind of SPC method but, compared to conventional SPC, it can achieve polysilicon under lower temperature (about 500°C - 600°C). This is because a thin metal layer is coated before crystallization anneal. The metal element is the key in lowering the activation energy of crystallization.

Cat-CVD: This method directly deposits poly-film without further thermal anneal. The deposition temperature has reportedly gone as low as 300°C. The growth mechanism involves the catalytic cracking reaction of SiH4-H2 mixture.

Laser anneal: This is the most popular method used currently. Excimer laser is used as an energy source to heat and melt a-Si with low Hydrogen content. It is later recrystallized as poly-film.

Next : 관련기술이 필요하신분은 당사로 문의주시기 바랍니다 !!

TEL : 031-497-1134

경기도 시흥시 정왕천로 197, A-512 (정왕동 동우디지털파크) | E-mail : contact@dtx.co.kr

Tel : 031-497-1134 (代) | Fax : 031-497-1138 | Internet Fax : 0505-497-7710

FEATURED PRODUCTS
◎ UV CURING SYSTEM	◎ INFRARED DRYING SYSTEM	◎ PULSE UV SYSTEM
◎ OPTICAL INSTRUMENTS	◎ PHOTONIC SINTERING SYSTEM	◎ X-UV SYSTEM
◎ SOLAR SIMULATION SYSTEM	◎ WEATHER / FADE TESTING SYSTEM	◎ PULSE UV STERILIZATION SYSTEM
◎ XENON IRRADIATION SYSTEM	◎ ENGINEERING	◎ INSPECTION SYSTEM
◎ LIGHT SOURCE	◎ PHOTONIC ACTIVATION SYSTEM